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Mask-induced polarization effects at high NA

dc.contributor.authorEstroff, Andrew
dc.contributor.authorFan, Yongfa
dc.contributor.authorBourov, Anatoly
dc.contributor.authorSmith, Bruce
dc.contributor.authorFoubert, Philippe
dc.contributor.authorLeunissen, Peter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorAksenov, Yuri
dc.date.accessioned2021-10-16T01:31:49Z
dc.date.available2021-10-16T01:31:49Z
dc.date.issued2005-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10438
dc.sourceIIOimport
dc.titleMask-induced polarization effects at high NA
dc.typeProceedings paper
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.beginpage555
dc.source.endpage566
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate28/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5754


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