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Process optimization of low temperature silicon nitride stressor layers for improvement of device performance for 45nm technology and below
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1926 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-16
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Metrics
Views
1926 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-16
Citations