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Ultra shallow junctions formed by sub-melt laser annealing

dc.contributor.authorFalepin, Annelies
dc.contributor.authorJanssens, Tom
dc.contributor.authorSeveri, Simone
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorFelch, S.B.
dc.contributor.authorParihar, V.
dc.contributor.authorMayur, A.
dc.date.accessioned2021-10-16T01:33:52Z
dc.date.available2021-10-16T01:33:52Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10449
dc.sourceIIOimport
dc.titleUltra shallow junctions formed by sub-melt laser annealing
dc.typeProceedings paper
dc.contributor.imecauthorFalepin, Annelies
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage87
dc.source.endpage91
dc.source.conference13th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
dc.source.conferencedate4/10/2005
dc.source.conferencelocationSanta Barbara, CA USA
imec.availabilityPublished - imec


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