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The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging

dc.contributor.authorGeh, Bernd
dc.contributor.authorFlagello, Donis
dc.contributor.authorProgler, Chris
dc.contributor.authorMartin, Patrick
dc.contributor.authorLeunissen, Peter
dc.contributor.authorHansen, Steve
dc.contributor.authorDe Boeij, Wim
dc.date.accessioned2021-10-16T01:41:41Z
dc.date.available2021-10-16T01:41:41Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10488
dc.sourceIIOimport
dc.titleThe impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage599210
dc.source.conference25th Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate3/10/2005
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5992


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