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Microstepper vs. interference EUV lithography: effects on resist profiles

dc.contributor.authorGronheid, Roel
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorGoethals, Mieke
dc.contributor.authorSolak, Harun H.
dc.contributor.authorEkinci, Yasin
dc.contributor.authorvan Ingen Schenau, Koen
dc.contributor.authorVannuffel, Cyril
dc.contributor.authorJouve, Amandine
dc.date.accessioned2021-10-16T01:50:45Z
dc.date.available2021-10-16T01:50:45Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10530
dc.sourceIIOimport
dc.titleMicrostepper vs. interference EUV lithography: effects on resist profiles
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVan Roey, Frieda
dc.source.peerreviewno
dc.source.conference4th International Symposium on EUV Lithography
dc.source.conferencedate7/11/2005
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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