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Linearity of TXRF: droplet residues versus spin-coated wafers

dc.contributor.authorHellin, David
dc.contributor.authorFyen, Wim
dc.contributor.authorRip, Jens
dc.contributor.authorDelande, Tinne
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-16T01:58:06Z
dc.date.available2021-10-16T01:58:06Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10563
dc.sourceIIOimport
dc.titleLinearity of TXRF: droplet residues versus spin-coated wafers
dc.typeProceedings paper
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorDelande, Tinne
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference11th Conference on Total Reflection X-Ray Fluorescence Analysis and Related Methods - TXRF
dc.source.conferencedate18/09/2005
dc.source.conferencelocationBudapest Hungary
imec.availabilityPublished - imec


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