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H2/D2 isotopic effect on negative bias temperature instabilities in SiOx/HfSiON/TaN gate stacks

dc.contributor.authorHoussa, Michel
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorStesmans, Andre
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T02:10:26Z
dc.date.available2021-10-16T02:10:26Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10612
dc.sourceIIOimport
dc.titleH2/D2 isotopic effect on negative bias temperature instabilities in SiOx/HfSiON/TaN gate stacks
dc.typeOral presentation
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorStesmans, Andre
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference36th IEEE Semiconductor Interface Specialists Conference
dc.source.conferencedate1/12/2005
dc.source.conferencelocationArlington, VA USA
imec.availabilityPublished - imec


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