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Trap generation and progressive wearout in thin HfSiON

dc.contributor.authorKauerauf, Thomas
dc.contributor.authorDegraeve, Robin
dc.contributor.authorCrupi, Felice
dc.contributor.authorKaczer, Ben
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorMaes, Herman
dc.date.accessioned2021-10-16T02:27:44Z
dc.date.available2021-10-16T02:27:44Z
dc.date.issued2005-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10680
dc.sourceIIOimport
dc.titleTrap generation and progressive wearout in thin HfSiON
dc.typeProceedings paper
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.source.peerreviewno
dc.source.beginpage45
dc.source.endpage49
dc.source.conference43rd Annual IEEE International Relibability Physics Symposium Proceedings
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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