Scalability of Ni FUSI gate processes: phase and Vt control to 30 nm gate lengths

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Authors
Kittl, Jorge; Veloso, Anabela; Lauwers, Anne; Kottantharayil, Anil; Demeurisse, Caroline; Kubicek, Stefan; Niwa, Masaaki; Van Dal, Mark; Richard, Olivier; Kmieciak, Malgorzata; Jurczak, Gosia; Vrancken, Christa; Chiarella, Thomas; Brus, Stephan; Maex, Karen; Biesemans, Serge
Conference
Symposium on VLSI Technology. Digest of Technical Papers
Title
Scalability of Ni FUSI gate processes: phase and Vt control to 30 nm gate lengths
Publication type
Proceedings paper
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