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High-k dielectrics integration prospects

dc.contributor.authorKubicek, Stefan
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.contributor.authorYamamoto, Kazuhiko
dc.contributor.authorBeckx, Stephan
dc.contributor.authorClaes, Martine
dc.contributor.authorVan Hoornick, Nausikaa
dc.contributor.authorKwak, Dong Hwa
dc.contributor.authorHyun, Sangjin
dc.contributor.authorRothschild, Aude
dc.contributor.authorVeloso, Anabela
dc.contributor.authorKottantharayil, Anil
dc.contributor.authorLujan, Guilherme
dc.contributor.authorKittl, Jorge
dc.contributor.authorLauwers, Anne
dc.contributor.authorKaushik, Vidya
dc.contributor.authorNiwa, Masaaki
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorJurczak, Gosia
dc.contributor.authorBiesemans, Serge
dc.date.accessioned2021-10-16T02:40:18Z
dc.date.available2021-10-16T02:40:18Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10726
dc.sourceIIOimport
dc.titleHigh-k dielectrics integration prospects
dc.typeProceedings paper
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorVan Hoornick, Nausikaa
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage169
dc.source.endpage192
dc.source.conferenceULSI Process Integration IV
dc.source.conferencedate15/05/2005
dc.source.conferencelocationQuebec Canada
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2005-06


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