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Protective films formed during the etching of TiSi2 and CoSi2 in F-based plasmas

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-29T14:16:31Z
dc.date.available2021-09-29T14:16:31Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1073
dc.sourceIIOimport
dc.titleProtective films formed during the etching of TiSi2 and CoSi2 in F-based plasmas
dc.typeOral presentation
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferenceMaterials Research Society Fall Meeting: Symposium Cb: Thin Films. Surface and Morphology; December 2-6, 1996; Boston, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


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