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Application of porous low-k dielectrics and copper in microelectronics

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorClaeys, Cor
dc.contributor.authorSnow, Jim
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-10-16T02:48:48Z
dc.date.available2021-10-16T02:48:48Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10757
dc.sourceIIOimport
dc.titleApplication of porous low-k dielectrics and copper in microelectronics
dc.typeOral presentation
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferenceSeminar on Micro-Nanotechnology
dc.source.conferencedate12/12/2005
dc.source.conferencelocationHo Chi Minh City Viet Nam
imec.availabilityPublished - imec


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