Show simple item record

Efficient cleaning of low-k materials using single-wafer cleaning solution: a compatibility study and electrical characterization

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorVanderheyden, Rudi
dc.contributor.authorKesters, Els
dc.contributor.authorKenis, Karine
dc.contributor.authorConard, Thierry
dc.contributor.authorBoullart, Werner
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-10-16T02:49:41Z
dc.date.available2021-10-16T02:49:41Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10760
dc.sourceIIOimport
dc.titleEfficient cleaning of low-k materials using single-wafer cleaning solution: a compatibility study and electrical characterization
dc.typeProceedings paper
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpage164
dc.source.endpage171
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing IX
dc.source.conferencedate16/10/2005
dc.source.conferencelocationLos Angeles, CA USA
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 1, No 3


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record