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Characterization of the growth of atomic layer deposited WNxCy films on various substrates

dc.contributor.authorMartin Hoyas, Ana
dc.contributor.authorTravaly, Youssef
dc.contributor.authorSchuhmacher, Jorg
dc.contributor.authorSajavaara, Timo
dc.contributor.authorWhelan, Caroline
dc.contributor.authorEyckens, Brenda
dc.contributor.authorRichard, Olivier
dc.contributor.authorGiangrandi,
dc.contributor.authorBrijs, Bert
dc.contributor.authorJonas, A.M.
dc.contributor.authorVantomme, Andre
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCelis, Jean-Pierre
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-16T03:20:33Z
dc.date.available2021-10-16T03:20:33Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10866
dc.sourceIIOimport
dc.titleCharacterization of the growth of atomic layer deposited WNxCy films on various substrates
dc.typeOral presentation
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVantomme, Andre
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.conferenceAVS 2005
dc.source.conferencedate21/03/2005
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec


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