Show simple item record

Accurate determination of channel length, series resistance and junction doping profile for MOSFET optimisation in deep submicron technologies

dc.contributor.authorBiesemans, Serge
dc.contributor.authorHendriks, Marton
dc.contributor.authorKubicek, Stefan
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-09-29T14:17:20Z
dc.date.available2021-09-29T14:17:20Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1091
dc.sourceIIOimport
dc.titleAccurate determination of channel length, series resistance and junction doping profile for MOSFET optimisation in deep submicron technologies
dc.typeProceedings paper
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorDe Meyer, Kristin
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage166
dc.source.endpage167
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate11/06/1996
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
1068.pdf
Size:
232.0Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record