Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM

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Authors
Nafria, M.; Blasco, X.; Porti, M.; Aguilera, L.; Aymerich, X.; Petry, Jasmine; Vandervorst, Wilfried
Conference
Spanish Conference on Electron Devices
Title
Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM
Publication type
Proceedings paper
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