Publication:
Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM
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1958 since deposited on 2021-10-16
2last month
Acq. date: 2026-07-16
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Statistics
Views
1958 since deposited on 2021-10-16
2last month
Acq. date: 2026-07-16
Citations