Publication:

Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM

Date

2005

Proceedings Paper

Simple item page Full metadata Statistics

Author(s)

Nafria, M.

;

Blasco, X.

;

Porti, M.

;

Aguilera, L.

;

Aymerich, X.

;

Petry, Jasmine

;

Vandervorst, Wilfried

Statistics

1956 since deposited on 2021-10-16

Acq. date: 2026-06-18