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Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM
Publication:
Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM
Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nafria, M.
;
Blasco, X.
;
Porti, M.
;
Aguilera, L.
;
Aymerich, X.
;
Petry, Jasmine
;
Vandervorst, Wilfried
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1952
since deposited on 2021-10-16
Acq. date: 2025-10-26
Citations
Metrics
Views
1952
since deposited on 2021-10-16
Acq. date: 2025-10-26
Citations