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Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application

dc.contributor.authorNiwa, Masaaki
dc.contributor.authorMitsuhashi, Riichirou
dc.contributor.authorYamamoto, K.
dc.contributor.authorHayashi, S.
dc.contributor.authorHarada, Yoshinao
dc.contributor.authorRothschild, Aude
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorKubicek, Stefan
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorBiesemans, Serge
dc.contributor.authorKubota, M.
dc.date.accessioned2021-10-16T03:39:46Z
dc.date.available2021-10-16T03:39:46Z
dc.date.issued2005-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10933
dc.sourceIIOimport
dc.titleCurrent status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application
dc.typeProceedings paper
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage6
dc.source.endpage7
dc.source.conferenceExtended Abstracts of the International Conference on Solid State Devices and Materials - SSDM
dc.source.conferencedate13/09/2005
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - imec


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