Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application

Publication:

2005

Proceedings Paper

Author(s)

Niwa, Masaaki

;

Mitsuhashi, Riichirou

;

Yamamoto, K.

;

Hayashi, S.

;

Harada, Yoshinao

;

Rothschild, Aude

;

Hoffmann, Thomas Y.

;

;

;

;

;

Kubota, M.

1962 since deposited on 2021-10-16

Acq. date: 2026-10-11