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Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application
Publication:
Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application
Date
2005-10
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Niwa, Masaaki
;
Mitsuhashi, Riichirou
;
Yamamoto, K.
;
Hayashi, S.
;
Harada, Yoshinao
;
Rothschild, Aude
;
Hoffmann, Thomas Y.
;
Kubicek, Stefan
;
De Gendt, Stefan
;
Heyns, Marc
;
Biesemans, Serge
;
Kubota, M.
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1955
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1955
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations