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On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition

dc.contributor.authorOnsia, Bart
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorDelabie, Annelies
dc.contributor.authorGottschalk, C.
dc.contributor.authorGreen, M.
dc.contributor.authorHeyns, Marc
dc.contributor.authorLin, S.
dc.contributor.authorMertens, Paul
dc.contributor.authorTsai, Wilman
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-16T03:47:04Z
dc.date.available2021-10-16T03:47:04Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10958
dc.sourceIIOimport
dc.titleOn the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition
dc.typeProceedings paper
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage19
dc.source.endpage22
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol 103-104


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