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A study of the influence of typical wet chemical treatments on the germanium wafer surface

dc.contributor.authorOnsia, Bart
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Peter
dc.contributor.authorRaskin, G.
dc.contributor.authorSioncke, Sonja
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorTheuwis, A.
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-16T03:47:26Z
dc.date.available2021-10-16T03:47:26Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10959
dc.sourceIIOimport
dc.titleA study of the influence of typical wet chemical treatments on the germanium wafer surface
dc.typeProceedings paper
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage27
dc.source.endpage30
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena Vol 103-104


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