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Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLeunissen, Peter
dc.contributor.authorDe Ruyter, Rudi
dc.contributor.authorJonckheere, Rik
dc.contributor.authorMartin, Patrick
dc.contributor.authorWakefield, Clare
dc.contributor.authorJohnson, Stephen
dc.contributor.authorCangemi, Mike
dc.contributor.authorBuxbaum, Alex
dc.contributor.authorMorrison, Troy
dc.date.accessioned2021-10-16T04:04:17Z
dc.date.available2021-10-16T04:04:17Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11016
dc.sourceIIOimport
dc.titleThrough-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Ruyter, Rudi
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage211
dc.source.endpage222
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XII
dc.source.conferencedate13/04/2005
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5853


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