Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
Publication:
Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
Date
2005
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Philipsen, Vicky
;
Leunissen, Peter
;
De Ruyter, Rudi
;
Jonckheere, Rik
;
Martin, Patrick
;
Wakefield, Clare
;
Johnson, Stephen
;
Cangemi, Mike
;
Buxbaum, Alex
;
Morrison, Troy
Journal
Abstract
Description
Metrics
Views
1884
since deposited on 2021-10-16
Acq. date: 2025-10-25
Citations
Metrics
Views
1884
since deposited on 2021-10-16
Acq. date: 2025-10-25
Citations