Authors

Philipsen, Vicky; Leunissen, Peter; De Ruyter, Rudi; Jonckheere, Rik; Martin, Patrick; Wakefield, Clare; Johnson, Stephen; Cangemi, Mike; Buxbaum, Alex; Morrison, Troy

Conference

Photomask and Next-Generation Lithography Mask Technology XII

Title

Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications

Publication type

Proceedings paper