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Conference contributions
Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
Publication:
Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Philipsen, Vicky
;
Leunissen, Peter
;
De Ruyter, Rudi
;
Jonckheere, Rik
;
Martin, Patrick
;
Wakefield, Clare
;
Johnson, Stephen
;
Cangemi, Mike
;
Buxbaum, Alex
;
Morrison, Troy
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1885
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations
Metrics
Views
1885
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations