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Low thermal budget Si epitaxy: an overview study of the substrate/epi interface in a number of common epitaxial growth systems

dc.contributor.authorCaymax, Matty
dc.contributor.authorVescan, L.
dc.contributor.authorWerner, K.
dc.contributor.authorBensahel, D.
dc.contributor.authorGravensteijn, D.
dc.contributor.authorSzendro, I.
dc.date.accessioned2021-09-29T14:18:31Z
dc.date.available2021-09-29T14:18:31Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1112
dc.sourceIIOimport
dc.titleLow thermal budget Si epitaxy: an overview study of the substrate/epi interface in a number of common epitaxial growth systems
dc.typeProceedings paper
dc.contributor.imecauthorCaymax, Matty
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage83
dc.source.endpage86
dc.source.conferenceProceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate23/09/1996
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access


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