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P implantation on doping of Ge: diffusion, activation, re-crystallization

dc.contributor.authorSatta, Alessandra
dc.contributor.authorJanssens, Tom
dc.contributor.authorClarysse, Trudo
dc.contributor.authorSimoen, Eddy
dc.contributor.authorMeuris, Marc
dc.contributor.authorBenedetti, Alessandro
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorDemeurisse, Caroline
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-16T04:50:38Z
dc.date.available2021-10-16T04:50:38Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11165
dc.sourceIIOimport
dc.titleP implantation on doping of Ge: diffusion, activation, re-crystallization
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorDemeurisse, Caroline
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.source.peerreviewno
dc.source.conferenceUSJ - The 8th Int. Workshop on the Fabrication, Characterization and Modeling of Ultra Shallow Junctions in Semiconductors
dc.source.conferencedate5/06/2005
dc.source.conferencelocationDaytona Beach, FL USA
imec.availabilityPublished - imec


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