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Modeling and characterization of noise in 90nm CMOS technology

dc.contributor.authorScholten, Andries
dc.contributor.authorTiemeijer, Luuk
dc.contributor.authorZegers-van Duijnhoven, A.T.A.
dc.contributor.authorHavens, R.J.
dc.contributor.authorde Kort, R.
dc.contributor.authorvan Langevelde, R.
dc.contributor.authorKlaassen, Dick
dc.contributor.authorJeamsaksiri, Wutthinan
dc.contributor.authorVelghe, R.D.M.A.
dc.date.accessioned2021-10-16T04:54:17Z
dc.date.available2021-10-16T04:54:17Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11176
dc.sourceIIOimport
dc.titleModeling and characterization of noise in 90nm CMOS technology
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage735
dc.source.endpage740
dc.source.conferenceNoise and Fluctuations: 18th International Conference on Noise and Fluctuations - ICNF
dc.source.conferencedate19/09/2005
dc.source.conferencelocationSalamanca Spain
imec.availabilityPublished - imec


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