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In-chip overlay metrology in 90 nm production

dc.contributor.authorSchultz, Bernd
dc.contributor.authorSeltmann, Rolf
dc.contributor.authorPaufler, Joerg
dc.contributor.authorLeray, Philippe
dc.contributor.authorKassel, Elyakim
dc.contributor.authorAdel, Mike
dc.contributor.authorIzikson, Pavel
dc.contributor.authorFrommer, Aviv
dc.date.accessioned2021-10-16T04:56:17Z
dc.date.available2021-10-16T04:56:17Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11182
dc.sourceIIOimport
dc.titleIn-chip overlay metrology in 90 nm production
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.source.peerreviewno
dc.source.conferenceInternational Symposium Semiconductor Manufacturing
dc.source.conferencedate13/09/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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