dc.contributor.author | Shamiryan, Denis | |
dc.contributor.author | Paraschiv, Vasile | |
dc.contributor.author | Beckx, Stephan | |
dc.contributor.author | Boullart, Werner | |
dc.date.accessioned | 2021-10-16T04:59:36Z | |
dc.date.available | 2021-10-16T04:59:36Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11192 | |
dc.source | IIOimport | |
dc.title | TaN metal gate etch with BCl3/O2 plamsa: gate profile and impact on high-k removal process | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Paraschiv, Vasile | |
dc.contributor.imecauthor | Beckx, Stephan | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.source.peerreview | no | |
dc.source.conference | International Conference on Microelectronics and Interfaces | |
dc.source.conferencedate | 21/03/2005 | |
dc.source.conferencelocation | Santa Clara, CA USA | |
imec.availability | Published - imec | |