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Deposition of Poly-SiGe with RTCVD
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Authors
Shi, Xiaoping
;
Schaekers, Marc
;
Brus, Stephan
;
Zhao, Chao
;
Brijs, Bert
;
Yu, HongYu
;
Kottantharayil, Anil
Conference
The 8th Technical and Scientific Meeting of CREMSI:FEOL from 130 to 65 nm : scaling challenges
Title
Deposition of Poly-SiGe with RTCVD
Publication type
Proceedings paper
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