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Characterization of extreme ultraviolet resists with interference lithography

dc.contributor.authorSolak, Harun H.
dc.contributor.authorEkinci, Yasin
dc.contributor.authorGronheid, Roel
dc.contributor.authorJouve, Amandine
dc.date.accessioned2021-10-16T05:20:32Z
dc.date.available2021-10-16T05:20:32Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11256
dc.sourceIIOimport
dc.titleCharacterization of extreme ultraviolet resists with interference lithography
dc.typeOral presentation
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.conference31st International Conference on Micro-and Nano- Engineering
dc.source.conferencedate19/09/2005
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - imec


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