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Pulsed DC sputtered aluminum nitride: a novel approach to control stress and C-axis orientation

dc.contributor.authorSoussan, Philippe
dc.contributor.authorO'Donnell, Kathy
dc.contributor.authorD'Haen, Jan
dc.contributor.authorVanhoyland, Geert
dc.contributor.authorBeyne, Eric
dc.contributor.authorTilmans, Harrie
dc.date.accessioned2021-10-16T05:21:14Z
dc.date.available2021-10-16T05:21:14Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11258
dc.sourceIIOimport
dc.titlePulsed DC sputtered aluminum nitride: a novel approach to control stress and C-axis orientation
dc.typeProceedings paper
dc.contributor.imecauthorSoussan, Philippe
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorBeyne, Eric
dc.contributor.imecauthorTilmans, Harrie
dc.contributor.orcidimecSoussan, Philippe::0000-0002-1347-6978
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.contributor.orcidimecTilmans, Harrie::0000-0003-4240-4962
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage49
dc.source.endpage54
dc.source.conferenceMaterials, Integration and Packaging Issues for High-Frequency Devices II
dc.source.conferencedate29/11/2004
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 833


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