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Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography

dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorKishimura, Shinji
dc.contributor.authorGronheid, Roel
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorErcken, Monique
dc.contributor.authorKocsis, Michael
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorBenndorf, Michael
dc.date.accessioned2021-10-16T05:25:47Z
dc.date.available2021-10-16T05:25:47Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11271
dc.sourceIIOimport
dc.titleStudies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.source.peerreviewno
dc.source.conference2nd International Symposium on Immersion Lithography
dc.source.conferencedate12/09/2005
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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