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Study of stress evolution during full silicidation for gate stacks
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Authors
Torregiani, Cristina
;
Kittl, Jorge
;
Capponi, Simona
;
Vanhoyland, Geert
;
Brongersma, Sywert
;
Lauwers, Anne
;
Van Houtte, Paul
;
Maex, Karen
Conference
Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment
Title
Study of stress evolution during full silicidation for gate stacks
Publication type
Proceedings paper
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