Publication:
Effect of the dielectric thickness and the metal deposition technique on the mobility for HfO2/TaN NMOS devices
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1914 since deposited on 2021-10-16
2last month
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Acq. date: 2026-01-11
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Views
1914 since deposited on 2021-10-16
2last month
2last week
Acq. date: 2026-01-11
Citations