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Conference contributions
Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applications
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Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applications
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Dal, Mark
;
Lauwers, Anne
;
Cunniffe, John
;
Verbeeck, Rita
;
Vrancken, Christa
;
Demeurisse, Caroline
;
Dao, T.
;
Tamminga, Y.
;
Veloso, Anabela
;
Kittl, Jorge
;
Maex, Karen
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1936
since deposited on 2021-10-16
Acq. date: 2026-08-05
Citations
Statistics
Views
1936
since deposited on 2021-10-16
Acq. date: 2026-08-05
Citations