dc.contributor.author | Van Dal, Mark | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | Cunniffe, John | |
dc.contributor.author | Verbeeck, Rita | |
dc.contributor.author | Vrancken, Christa | |
dc.contributor.author | Demeurisse, Caroline | |
dc.contributor.author | Dao, T. | |
dc.contributor.author | Tamminga, Y. | |
dc.contributor.author | Veloso, Anabela | |
dc.contributor.author | Kittl, Jorge | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-16T05:59:01Z | |
dc.date.available | 2021-10-16T05:59:01Z | |
dc.date.issued | 2005-05 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11365 | |
dc.source | IIOimport | |
dc.title | Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applications | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Van Dal, Mark | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.imecauthor | Verbeeck, Rita | |
dc.contributor.imecauthor | Vrancken, Christa | |
dc.contributor.imecauthor | Demeurisse, Caroline | |
dc.contributor.imecauthor | Veloso, Anabela | |
dc.contributor.imecauthor | Maex, Karen | |
dc.source.peerreview | no | |
dc.source.beginpage | 233 | |
dc.source.endpage | 240 | |
dc.source.conference | Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment | |
dc.source.conferencedate | 16/05/2005 | |
dc.source.conferencelocation | Quebec Canada | |
imec.availability | Published - imec | |
imec.internalnotes | Electrochemical Society Proceedings; Vol. 2005-05 | |