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Lithographic importance of acid diffusion in chemically amplified resists

dc.contributor.authorVan Steenwinckel, David
dc.contributor.authorLammers, Jeroen
dc.contributor.authorLeunissen, Peter
dc.contributor.authorKwinten, Hans
dc.date.accessioned2021-10-16T06:26:29Z
dc.date.available2021-10-16T06:26:29Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11443
dc.sourceIIOimport
dc.titleLithographic importance of acid diffusion in chemically amplified resists
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage269
dc.source.endpage280
dc.source.conferenceAdvances in Resist Technology and Processing XXII
dc.source.conferencedate28/02/2005
dc.source.conferencelocationSan Jose, CA usa
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5753


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