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Lithographic importance of acid diffusion in chemically amplified resists
Publication:
Lithographic importance of acid diffusion in chemically amplified resists
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Steenwinckel, David
;
Lammers, Jeroen
;
Leunissen, Peter
;
Kwinten, Hans
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1919
since deposited on 2021-10-16
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last month
Acq. date: 2025-12-11
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1919
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-11
Citations