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Lithographic importance of acid diffusion in chemically amplified resists
Publication:
Lithographic importance of acid diffusion in chemically amplified resists
Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Steenwinckel, David
;
Lammers, Jeroen
;
Leunissen, Peter
;
Kwinten, Hans
Journal
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1916
since deposited on 2021-10-16
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Acq. date: 2025-10-24
Citations
Metrics
Views
1916
since deposited on 2021-10-16
405
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations