Publication:
Lithographic importance of acid diffusion in chemically amplified resists
Date
| dc.contributor.author | Van Steenwinckel, David | |
| dc.contributor.author | Lammers, Jeroen | |
| dc.contributor.author | Leunissen, Peter | |
| dc.contributor.author | Kwinten, Hans | |
| dc.date.accessioned | 2021-10-16T06:26:29Z | |
| dc.date.available | 2021-10-16T06:26:29Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11443 | |
| dc.source.beginpage | 269 | |
| dc.source.conference | Advances in Resist Technology and Processing XXII | |
| dc.source.conferencedate | 28/02/2005 | |
| dc.source.conferencelocation | San Jose, CA usa | |
| dc.source.endpage | 280 | |
| dc.title | Lithographic importance of acid diffusion in chemically amplified resists | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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