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Dopant/carrier profiling for sub-45nm technologies

dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorJanssens, Tom
dc.contributor.authorEyben, Pierre
dc.contributor.authorDuriau, Edouard
dc.date.accessioned2021-10-16T06:34:26Z
dc.date.available2021-10-16T06:34:26Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11466
dc.sourceIIOimport
dc.titleDopant/carrier profiling for sub-45nm technologies
dc.typeMeeting abstract
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorEyben, Pierre
dc.source.peerreviewno
dc.source.conference8th International Workshop on Fabrication, Characterization and Modeling of Ultra Shallow Junctions in Semiconductors
dc.source.conferencedate5/06/2005
dc.source.conferencelocationDaytona Beach, FL USA
imec.availabilityPublished - imec


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