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Photoresist stripping by Ozone/water processes: effect of additives

dc.contributor.authorVankerckhoven, Hans
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorVandersmissen, Kevin
dc.contributor.authorClaes, Martine
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-16T06:38:59Z
dc.date.available2021-10-16T06:38:59Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11479
dc.sourceIIOimport
dc.titlePhotoresist stripping by Ozone/water processes: effect of additives
dc.typeProceedings paper
dc.contributor.imecauthorVandersmissen, Kevin
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage309
dc.source.endpage313
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol 103-104


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