dc.contributor.author | Vankerckhoven, Hans | |
dc.contributor.author | De Smedt, Frank | |
dc.contributor.author | Vandersmissen, Kevin | |
dc.contributor.author | Claes, Martine | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Vinckier, Chris | |
dc.date.accessioned | 2021-10-16T06:38:59Z | |
dc.date.available | 2021-10-16T06:38:59Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11479 | |
dc.source | IIOimport | |
dc.title | Photoresist stripping by Ozone/water processes: effect of additives | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vandersmissen, Kevin | |
dc.contributor.imecauthor | Claes, Martine | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 309 | |
dc.source.endpage | 313 | |
dc.source.conference | Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium | |
dc.source.conferencedate | 20/09/2004 | |
dc.source.conferencelocation | Brussels Belgium | |
imec.availability | Published - open access | |
imec.internalnotes | Solid State Phenomena; Vol 103-104 | |