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Photoresist stripping by Ozone/water processes: effect of additives
Publication:
Photoresist stripping by Ozone/water processes: effect of additives
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Date
2005
Proceedings Paper
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10484.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vankerckhoven, Hans
;
De Smedt, Frank
;
Vandersmissen, Kevin
;
Claes, Martine
;
De Gendt, Stefan
;
Heyns, Marc
;
Vinckier, Chris
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Views
1859
since deposited on 2021-10-16
2
last month
2
last week
Acq. date: 2026-01-07
Citations