Publication:
Photoresist stripping by Ozone/water processes: effect of additives
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0009-0007-6964-7434 | |
| cris.virtual.orcid | 0000-0003-3775-3578 | |
| cris.virtual.orcid | 0009-0008-7831-564X | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtualsource.department | 3e15c10a-8884-477b-b40c-a6ff454aa560 | |
| cris.virtualsource.department | 1fd77399-4d0a-4004-8a7f-9634c67c90de | |
| cris.virtualsource.department | 046a4037-4001-4b14-a082-e7938355f1f1 | |
| cris.virtualsource.department | 71dc0efb-51fe-4642-a819-927df76262a0 | |
| cris.virtualsource.orcid | 3e15c10a-8884-477b-b40c-a6ff454aa560 | |
| cris.virtualsource.orcid | 1fd77399-4d0a-4004-8a7f-9634c67c90de | |
| cris.virtualsource.orcid | 046a4037-4001-4b14-a082-e7938355f1f1 | |
| cris.virtualsource.orcid | 71dc0efb-51fe-4642-a819-927df76262a0 | |
| dc.contributor.author | Vankerckhoven, Hans | |
| dc.contributor.author | De Smedt, Frank | |
| dc.contributor.author | Vandersmissen, Kevin | |
| dc.contributor.author | Claes, Martine | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.author | Vinckier, Chris | |
| dc.contributor.imecauthor | Vandersmissen, Kevin | |
| dc.contributor.imecauthor | Claes, Martine | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2021-10-16T06:38:59Z | |
| dc.date.available | 2021-10-16T06:38:59Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11479 | |
| dc.source.beginpage | 309 | |
| dc.source.conference | Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium | |
| dc.source.conferencedate | 20/09/2004 | |
| dc.source.conferencelocation | Brussels Belgium | |
| dc.source.endpage | 313 | |
| dc.title | Photoresist stripping by Ozone/water processes: effect of additives | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |