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Wafer backside cleaning strategies for high-k/metal gate processing

dc.contributor.authorVos, Rita
dc.contributor.authorKesters, Els
dc.contributor.authorGaraud, Sylvain
dc.contributor.authorDe Waele, Rita
dc.contributor.authorKenis, Karine
dc.contributor.authorLux, Marcel
dc.contributor.authorKraus, Harald
dc.contributor.authorSnow, Jim
dc.contributor.authorShamiryan, Denis
dc.contributor.authorCatana, Gabriela
dc.contributor.authorDeweerd, Wim
dc.contributor.authorSchram, Tom
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-16T06:57:15Z
dc.date.available2021-10-16T06:57:15Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11527
dc.sourceIIOimport
dc.titleWafer backside cleaning strategies for high-k/metal gate processing
dc.typeProceedings paper
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage241
dc.source.endpage244
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol 103-104


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