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Rare-earth metal scandate high-k layers: promises and problems

dc.contributor.authorZhao, Chao
dc.contributor.authorHeeg, T.
dc.contributor.authorWagner, M.
dc.contributor.authorSchubert, J.
dc.contributor.authorWitters, Thomas
dc.contributor.authorBrijs, Bert
dc.contributor.authorBender, Hugo
dc.contributor.authorRichard, Olivier
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorHoussa, Michel
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-16T07:28:40Z
dc.date.available2021-10-16T07:28:40Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11607
dc.sourceIIOimport
dc.titleRare-earth metal scandate high-k layers: promises and problems
dc.typeMeeting abstract
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceMeeting Abstracts 208th Electrochemical Society Meeting: 3rd International Symposium on High Dielectric Constant Gate Stacks
dc.source.conferencedate16/10/2005
dc.source.conferencelocationLos Angeles, CA USA
imec.availabilityPublished - imec
imec.internalnotesAbstract 0505


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