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Optimized illumination sources for through-pitch contact hole printing at 1.20 and 1.35NA.

dc.contributor.authorBekaert, Joost
dc.contributor.authorTruffert, Vincent
dc.contributor.authorWillems, Patrick
dc.contributor.authorVan Look, Lieve
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-16T15:03:27Z
dc.date.available2021-10-16T15:03:27Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11710
dc.sourceIIOimport
dc.titleOptimized illumination sources for through-pitch contact hole printing at 1.20 and 1.35NA.
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorWillems, Patrick
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.source.peerreviewno
dc.source.conference4th Immersion Symposium
dc.source.conferencedate8/10/2007
dc.source.conferencelocationKeystone, CO USA
imec.availabilityPublished - imec


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