All wet strip approaches for post-etch photoresist layers after low-k patterning

Thumbnail
View/open
Metadata
Show full item record
Authors
Claes, Martine; Le, Quoc Toan; Kesters, Els; Lux, Marcel; Urionabarrenetxea, Ainara; Vereecke, Guy; Mertens, Paul; Carleer, R.; Adriaensens, P.
Conference
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
Title
All wet strip approaches for post-etch photoresist layers after low-k patterning
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections