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Advanced carrier depth profiling on Si and Ge with M4PP

dc.contributor.authorClarysse, Trudo
dc.contributor.authorEyben, Pierre
dc.contributor.authorParmentier, Brigitte
dc.contributor.authorVan Daele, Benny
dc.contributor.authorSatta, Alessandra
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorLin, Rong
dc.contributor.authorPetersen, Dirch
dc.contributor.authorFolmer Nielsen, Peter
dc.date.accessioned2021-10-16T15:20:43Z
dc.date.available2021-10-16T15:20:43Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11884
dc.sourceIIOimport
dc.titleAdvanced carrier depth profiling on Si and Ge with M4PP
dc.typeProceedings paper
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorParmentier, Brigitte
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.conferenceInternational Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling
dc.source.conferencedate6/05/2007
dc.source.conferencelocationNapa, CA USA
imec.availabilityPublished - imec


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