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Electromigration study of ultra narrow copper lines in low-k dielectric

dc.contributor.authorCroes, Kristof
dc.contributor.authorMoon, Kwang Jin
dc.contributor.authorCarbonell, Laure
dc.contributor.authorStruyf, Herbert
dc.contributor.authorHeylen, Nancy
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-16T15:26:18Z
dc.date.available2021-10-16T15:26:18Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11924
dc.sourceIIOimport
dc.titleElectromigration study of ultra narrow copper lines in low-k dielectric
dc.typeOral presentation
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.source.peerreviewno
dc.source.conferenceAdvanced Materials Conference - AMC
dc.source.conferencedate9/10/2007
dc.source.conferencelocationAlbany, NY USA
imec.availabilityPublished - imec


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